Electrical Resistance of Thin Films Deposited by Kathode Discharge
نویسندگان
چکیده
منابع مشابه
Electrical Properties of Plasma Deposited Thin Films
Abstract. It is well known that MIM (metal-insulator-metal) structures exhibit various high-field processes, which may be either electrode-limited (e.g. tunneling, Schottky-barrier emission) or bulk-limited (e.g. space-charge-limited conduction, Poole-Frenkel conduction). Thin films prepared using PECVD (plasma-enhanced chemical vapour deposition)exhibited Pool-Frenkel conductivity (Schottky co...
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ژورنال
عنوان ژورنال: Physical Review (Series I)
سال: 1900
ISSN: 1536-6065
DOI: 10.1103/physrevseriesi.11.40